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    Please use this identifier to cite or link to this item: http://ir.nknu.edu.tw/ir/handle/987654321/22105


    題名: Delta-Doping Inter band Tunneling diode by Metal-Organic Chemical Vapor Deposition
    Authors: Ruey-Lue Wang;Y. K. Su;R. L. Wang;H. H. Tsai
    王瑞祿
    Date: 1993
    Issue Date: 2014-11-14 18:05:43 (UTC+8)
    關聯: IEEE Tran, Electron Devices, pp.2192-2198. (SCI)
    Appears in Collections:[電子工程學系] 期刊論文
    [電子系] 王瑞祿

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