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    Items for Author "Y.L. Yang" 

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    Showing 9 items.

    Collection Date 題名 Authors Bitstream
    [電子工程學系] 會議論文 2011-11 Reliability Improvement of 28nm Gate Last High-k/Metal Gate Device with Oxygen Annealing Y.L. Yang; Y.P. Huang; P.T. Chen; W.Q. Zhang; C.Y. Cheng; L.K. Chin; C.W. Hsu; W.K. Yeh; 楊宜霖
    [電子工程學系] 會議論文 2009-12 Inelastic Electron Tunneling Spectroscopy Study of Ultra-Thin TiO2/Al2O3 on GaAs Z. Liu; X.W. (Sharon) Wang; W. Zhang; Y.L. Yang; T.P. Ma; 楊宜霖
    [電子工程學系] 會議論文 2008-12 Charge Trapping Memory Stack with Aluminum Oxide as the Tunnel Barrier J.F Yang; X.W. (Sharon) Wang; Y.L. Yang; T.P. Ma; 楊宜霖
    [電子工程學系] 會議論文 2007-12 Investigation of Strain-Temperature Stress Effects on the Characteristics of MOS Capacitors with Ultra-thin Gate Oxides C.N. Lin; Y.L. Yang; W.T. Chen; S.C. Lin; J.G. Hwu; 楊宜霖
    [電子工程學系] 會議論文 2006-12 Hydrogen Eraser for Tightening VT Distribution of Nitride Trapping Memory Y.L. Yang; C.H. Chang; Y.H. Shih; K.Y. Hsieh; J.G. Hwu; 楊宜霖
    [電子工程學系] 期刊論文 2008-09 Effect of Strain-Temperature Stress on MOS Structure with Ultra-thin Gate Oxide C.N. Lin; Y.L. Yang; W.T. Chen; S.C. Lin; K.C. Chuang; J.G. Hwu; 楊宜霖
    [電子工程學系] 期刊論文 2007-06 Modeling and Characterization of Hydrogen Induced Charge Loss in Nitride Trapping Memory Y.L. Yang; C.H. Chang; Y.H. Shih; K.Y. Hsieh; J.G. Hwu; 楊宜霖
    [電子工程學系] 期刊論文 2004-10 Quality Improvement of Ultra-Thin Gate Oxide by Using Thermal-Growth Followed by Scanning-Frequency Anodization (SF ANO) Technique Y.L. Yang; J.G. Hwu; 楊宜霖
    [電子工程學系] 期刊論文 2004-09 Growth-Then-Anodization Technique for Reliable Ultra-Thin Gate Oxides W.J. Liao; Y.L. Yang; S.C. Chuang; J.G. Hwu; 楊宜霖

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