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    Items for Author "楊宜霖" 

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    Showing 19 items.

    Collection Date 題名 Authors Bitstream
    [電子工程學系] 會議論文 2012-06 Reliability Improvement of 28nm High-k/Metal Gate Device by Using Oxygen Annealing Yi-Lin Yang; Wenqi Zhang; Chi-Yun Cheng; Yi-Ping Huang; Pin-Tseng Chen; Li-Kong Chin; Chia-Wei Hsu; Wen-Kuan Yeh; 楊宜霖
    [電子工程學系] 會議論文 2011-11 Reliability Improvement of 28nm Gate Last High-k/Metal Gate Device with Oxygen Annealing Y.L. Yang; Y.P. Huang; P.T. Chen; W.Q. Zhang; C.Y. Cheng; L.K. Chin; C.W. Hsu; W.K. Yeh; 楊宜霖
    [電子工程學系] 會議論文 2011-10 A Proposed High Manufacturability Strain Technology for High-k/Metal Gate SiGe-SOI CMOSFET W.K. Yeh; C.Y. Cheng; Y.L Yang; C.T. Lin; C.M. Lai; Y.W. Chen; C. H. Hsu; C.W. Yang; P.Y. Chen; 楊宜霖
    [電子工程學系] 會議論文 2011-04 The Improvement of Reliability of 28nm High-k/Metal Gate Device with Various PMA Conditions Chi-Yun Cheng; Wen-Kuan Yeh; Yi-Lin Yang; Chia-Wei Hsu; 楊宜霖
    [電子工程學系] 會議論文 2009-12 Inelastic Electron Tunneling Spectroscopy Study of Ultra-Thin TiO2/Al2O3 on GaAs Z. Liu; X.W. (Sharon) Wang; W. Zhang; Y.L. Yang; T.P. Ma; 楊宜霖
    [電子工程學系] 會議論文 2008-12 Charge Trapping Memory Stack with Aluminum Oxide as the Tunnel Barrier J.F Yang; X.W. (Sharon) Wang; Y.L. Yang; T.P. Ma; 楊宜霖
    [電子工程學系] 會議論文 2007-12 Investigation of Strain-Temperature Stress Effects on the Characteristics of MOS Capacitors with Ultra-thin Gate Oxides C.N. Lin; Y.L. Yang; W.T. Chen; S.C. Lin; J.G. Hwu; 楊宜霖
    [電子工程學系] 會議論文 2006-12 Hydrogen Eraser for Tightening VT Distribution of Nitride Trapping Memory Y.L. Yang; C.H. Chang; Y.H. Shih; K.Y. Hsieh; J.G. Hwu; 楊宜霖
    [電子工程學系] 期刊論文 2012-08 Reliability Improvement of 28nm High-k/Metal Gate-Last MOSFET using Appropriate Oxygen Annealing Yi-Lin Yang; Wenqi Zhang; Chi-Yun Cheng; Yi-Ping Huang; Pin-Tseng Chen; Chia-Wei Hsu; Li-Kong Chin; Chien-Ting Lin; Che-Hua Hsu; Chien-Ming Lai; Wen-Kuan Yeh; 楊宜霖
    [電子工程學系] 期刊論文 2012 The Improvement of Reliability of High-k/Metal Gate pMOSFET Device with Various PMA Conditions Yi-Lin Yang; Wenqi Zhang; Chi-Yun Cheng; Wen-Kuan Yeh; 楊宜霖
    [電子工程學系] 期刊論文 2008-09 Effect of Strain-Temperature Stress on MOS Structure with Ultra-thin Gate Oxide C.N. Lin; Y.L. Yang; W.T. Chen; S.C. Lin; K.C. Chuang; J.G. Hwu; 楊宜霖
    [電子工程學系] 期刊論文 2007-06 Modeling and Characterization of Hydrogen Induced Charge Loss in Nitride Trapping Memory Y.L. Yang; C.H. Chang; Y.H. Shih; K.Y. Hsieh; J.G. Hwu; 楊宜霖
    [電子工程學系] 期刊論文 2006-07 Impact of Strain-Temperature Stress on Ultrathin Oxide C.W. Tung, Y.L. Yang and J.G. Hwu; 楊宜霖
    [電子工程學系] 期刊論文 2004-10 Quality Improvement of Ultra-Thin Gate Oxide by Using Thermal-Growth Followed by Scanning-Frequency Anodization (SF ANO) Technique Y.L. Yang; J.G. Hwu; 楊宜霖
    [電子工程學系] 期刊論文 2004-09 Growth-Then-Anodization Technique for Reliable Ultra-Thin Gate Oxides W.J. Liao; Y.L. Yang; S.C. Chuang; J.G. Hwu; 楊宜霖
    [電子工程學系] 研究計畫 2015-08 具不同摻雜濃度之超薄絕緣層上矽晶及超薄底絕緣層金氧半場效電晶體閘極絕緣層可靠度之分析與探討 楊宜霖
    [電子工程學系] 研究計畫 2014-08 非平面結構金氧半場效電晶體閘極絕緣層可靠度之分析與探討 楊宜霖
    [電子工程學系] 研究計畫 2013-08 電阻式記憶體之低能耗製程技術開發(II) 楊宜霖
    [電子工程學系] 研究計畫 2011-08 電阻式記憶體之低能耗製程技術開發(I) 楊宜霖

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