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    Please use this identifier to cite or link to this item: http://ir.nknu.edu.tw/ir/handle/987654321/22248

    題名: 快速熱製程中熱輻射對超薄氧化層膜金氧半元件影響之研究
    The Study of Effects of Thermal Radiation on MOS Devices with Ultra-Thin Oxide Films during Rapid Thermal Processing
    Authors: 黃嘉宏
    Chia-Hong Huang
    Date: 2002-08
    Issue Date: 2014-11-20 13:58:34 (UTC+8)
    Abstract: 應用研究, 研究期間 9108~9207 , 研究經費 509千元
    關聯: 行政院國家科學委員會計畫 / 計畫編號 NSC91-2215-E234-001
    Appears in Collections:[電子工程學系] 研究計畫
    [電子系] 黃嘉宏

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