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    Please use this identifier to cite or link to this item: http://ir.nknu.edu.tw/ir/handle/987654321/21922


    題名: Enhancement in Soft Breakdown Occurrence on Ultra-thin Gate Oxides Caused by Photon Effect in Rapid Thermal Post Oxidation Annealing
    Authors: Chia-Hong Huang;Jenn-Gwo Hwu
    黃嘉宏
    Date: 2000
    Issue Date: 2014-11-03 16:29:26 (UTC+8)
    關聯: Solid-State Electronics, vol. 44, no. 8, p. 1405-10, 2000. (SCI)
    Appears in Collections:[電子工程學系] 期刊論文
    [電子系] 黃嘉宏

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