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    Please use this identifier to cite or link to this item: http://ir.nknu.edu.tw/ir/handle/987654321/21919


    題名: Effect of Mechanical Stress on the Characteristics of Silicon Thermal Oxides
    Authors: Chia-Hong Huang;Jui-Yuan Yen;Jenn-Gwo Hwu
    黃嘉宏
    Date: 2002
    Issue Date: 2014-11-03 16:29:23 (UTC+8)
    關聯: Japanese Journal of Applied Physics, vol. 41, Part 1, no. 1, p. 81-82, 2002. (SCI)
    Appears in Collections:[電子工程學系] 期刊論文
    [電子系] 黃嘉宏

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